RESEARCH

Equipments

Fabrication Equipment

<Thermal and e-beam Evaporator>
Material : Pd, Al, Au, Ti, Cu, etc.
 
<RF/DC Magnetron Sputter for High-k Oxides>
Material : HfO2, ZrO2
<RF/DC Magnetron Sputter for Various Metals>
Material : Cu, Ti, etc.
 
<Home Made Rapid Thermal Processor>
<Resistive Heating Furnace>
 
<ULVAC MILA-3000 Rapid Thermal Processor>
<Spin Coater>
 
<DI Water Supply System>
<Scrubber & Gas Supply System>
   

 

Analysis Equipment

<Measurement System in Vacuum>
- - Three Terminal Probes
- - Microscope
- - Turbo/Rotary Pump
- - O2/N2/N2O Gas Supply
 
<Probe Station>
<Micro Scope>
 

<Probe Station with Microscope>
<Measurement System for Semiconductor Devices>
HP 4145, HP4140
Boonton, etc
 
<Leica Microscope>

 

Scanning probe microrscopy

SPA-300HV
<High Vacuum and Variable Temperature SPM>
 
SPA-400
<Multi Function SPM Unit>

 

Atmosphere Pressure Plasma Etching Equipment

<Cryostats>
- Magnetic fields of up to 12 T
- Inserts provide sample temperatures from 1.5 to 300 K.
 
<Lock-in Amp.>
<Cryostats controller and measurement system>
 
<Turbo pump>
- ~ 10-7 torr

 

Photoluminescence mesurement Equipment

<Ar+ Laser-left side>
-488~ 514 nm, ~15 W
<ND-YLF laser ?right side>
-1053, 1313 nm
 
<Voltage source>
- -10 ~ +10 V
<Monocro meter>
Triax 550
-Spectra range 0 ~ 1500 nm
 
<InGaAs Detector>
IGA020L
-Wavelength
800 ~ 1700 nm

 

 

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