- RESEARCH & FACILITY
- NANO DEVICES
- Equipment
RESEARCH & FACILITY
Fabrication Equipment
-
< Thermal and e-beam Evaporator >
Material : Pd, Al, Au, Ti, Cu, etc.
-
< RF/DC Magnetron Sputter for High-k Oxides >
Material : HfO2, ZrO2
-
< RF/DC Magnetron Sputter for Various Metals >
Material : Cu, Ti, etc.
-
< Home Made Rapid Thermal Processor >
-
< Resistive Heating Furnace >
-
< ULVAC MILA-3000 Rapid Thermal Processor >
-
< Spin Coater >
-
< DI Water Supply System >
-
< Scrubber & Gas Supply System >
Analysis Equipment
-
< Measurement System in Vacuum >
- Three Terminal Probes
- Microscope
- Turbo/Rotary Pump
- O2/N2/N2O Gas Supply
-
< Probe Station >
-
< Micro Scope >
-
< Probe Station with Microscope >
-
< Measurement System for Semiconductor Devices >
HP 4145, HP4140
Boonton, etc
-
< Leica Microscope >
Scanning probe microrscopy
-
SPA-300HV
< High Vacuum and Variable Temperature SPM >
-
SPA-400
< Multi Function SPM Unit >
Atmosphere Pressure Plasma Etching Equipment
-
< Cryostats >
- Magnetic fields of up to 12 T
- Inserts provide sample temperatures from 1.5 to 300 K.
-
< Lock-in Amp >
-
< Cryostats controller and measurement system >
-
< Turbo pump >
- ~ 10-7 torr
Photoluminescence mesurement Equipment
-
< Ar+ Laser-left side >
- 488~ 514 nm, ~15 W
< ND-YLF laser ?right side >
-1053, 1313 nm
-
< Voltage source >
- -10 ~ +10 V
-
< Monocro meter >
Triax 550
- Spectra range 0 ~ 1500 nm
-
< InGaAs Detector >
IGA020L
- Wavelength
800 ~ 1700 nm