- RESEARCH & FACILITY
- NANO MATERIALS
- Equipment
RESEARCH & FACILITY
Fabrication Equipment
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< Thermal and e-beam Evaporator >
Material : Pd, Al, Au, Ti, Cu, etc.
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< RF/DC Magnetron Sputter for High-k Oxides >
Material : HfO2, ZrO2
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< RF/DC Magnetron Sputter for Various Metals >
Material : Cu, Ti, etc.
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< Home Made Rapid Thermal Processor >
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< Resistive Heating Furnace >
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< ULVAC MILA-3000 Rapid Thermal Processor >
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< Spin Coater >
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< DI Water Supply System >
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< Scrubber & Gas Supply System >
Analysis Equipment
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< Measurement System in Vacuum >
- Three Terminal Probes
- Microscope
- Turbo/Rotary Pump
- O2/N2/N2O Gas Supply
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< Probe Station >
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< Micro Scope >
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< Probe Station with Microscope >
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< Measurement System for Semiconductor Devices >
HP 4145, HP4140
Boonton, etc
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< Leica Microscope >
Scanning probe microrscopy
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SPA-300HV
< High Vacuum and Variable Temperature SPM >
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SPA-400
< Multi Function SPM Unit >
Atmosphere Pressure Plasma Etching Equipment
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< Cryostats >
- Magnetic fields of up to 12 T
- Inserts provide sample temperatures from 1.5 to 300 K.
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< Lock-in Amp >
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< Cryostats controller and measurement system >
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< Turbo pump >
- ~ 10-7 torr
Photoluminescence mesurement Equipment
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< Ar+ Laser-left side >
- 488~ 514 nm, ~15 W
< ND-YLF laser ?right side >
-1053, 1313 nm
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< Voltage source >
- -10 ~ +10 V
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< Monocro meter >
Triax 550
- Spectra range 0 ~ 1500 nm
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< InGaAs Detector >
IGA020L
- Wavelength
800 ~ 1700 nm
